Deposition

TystarLPCVD_000

Tystar LPCVD Furnace

The Tystar Low-Pressure-Chemical-Vapor-Deposition (LPCVD) object consists of four horizontal sub-atmospheric furnace tubes that can process up to 6″ diameter silicon wafers. The furnaces are fully computer controlled and are configured to deposit doped and undoped polysilicon, silicon dioxide, and silicon nitride films. The object is capable of depositing films with wafer-to-wafer and within-wafer uniformity of better than 5%. This object was donated to UTD by the Von Ehr Foundation.

Process Data

Control Charts

PM Details

UnaxisPECVD

Plasma-Therm 790 PECVD

The Plasma Enhanced Chemical Vapor Deposition Plasma-Therm 790 PECVD tool is configured with 2% silane in helium to deposit high-quality silicon carbide, silicon dioxide, silicon nitride, and amorphous silicon films at temperatures from 100 C to 300 C. The tool was donated to UTD in May 2004 by the Mykrolis Corporation.

Process Data

Control Charts

 

CambridgeALD

Cambridge NanoTech Savannah 100 Atomic Layer Deposition

The Atomic Layer Deposition system deposits thin films of dielectrics such as Hafnium oxide.

Process Data

Control Chart

ParyleneCoater

SCS Parylene Deposition

The Parylene coater deposits parylene in thin films to serve as an insulating coating for organic semiconductors.

Parylene Deposition Uniformity