Surface Chemistry

SpinRinseDryer

Avenger Basic Dual Chamber Spin Rinse Dryer

The Avenger Basic Spin Rinse Dryer is a dual chamber wafer washer system with 3” and 4” diameter substrate capabilities. The substrates are held in a standard Teflon wafer boat that is balanced along with the rotor frames by the manufacturer. This means that you can only spin your substrates using the designated boat or an identical substitute. The system can run any of 5 different spin rinse programs. There are two basic default programs set into the microprocessor memory: Program “0” is a spin-only dry program and Program “1” is a rinse and subsequent dry program. This object is run by a microprocessor behind a touch screen, so programs can be easily changed and assigned to a spinner module.

Tousimis

Tousimis Supercritical Spin Rinse Dryer

The Supercritical Dryer is a system for rinsing typically a MEMS device after sacrificial layer etch.  If the HF etchant was rinsed with water and dried, the surface tension of the water could pull structures such as cantilevers into contact with other parts resulting in bonding which would not allow movement of the MEMS part.  The Superciritical Point Drier uses liguid CO2 to displace the fluid (the HF is first displaced with alcohol), the CO2 is then heated to change to a gas.  This dries and rinses the MEMS device without damaging the components of it.

The CO2 transition is accompanied by a pressure rise to as high as 1500 psi.  Therefore the Drier has thick steel casing and multiple strong bolts holding the lid on.

Samco

Samco UV Ozone Stripper/Cleaner

The Samco Deep UV cleaner is a  system using 185 nM and 254 nM energy with Oxygen or Ozone to remove compounds from the surface of a substrate.  This can result in an atomically clean surface.  Typically, most of the compounds (photoresist, etchant masks) will be removed with a chemical stripper.  The DUV cleaner is only used for the last few percent of compound left.

The Samco has many operational variables, heat, time, oxygen, ozone, DUV light.  All of these may be combined or run singly.

AcidHood_000

Acid Hood

The Acid Hood is designed for the safe handling and disposal of acidic liquids only. It is constructed of chemical and fire resistant white plastic with a 3 by 2.5 foot working surface. The hood features a temperature controlled hot plate, a deionized-water sink and faucet, DI water and nitrogen spray guns, and two process timers.

AcidHood_000

Base Hood

The Base Hood is designed for the safe use of basic liquids only. It is constructed of chemical and fire resistant white plastic with a 3 by 2.5 foot working surface. The hood features a temperature controlled hot plate, a deionized-water sink and faucet, DI water and nitrogen spray guns, and two process timers.

RCAHood

RCA Hood

The RCA Hood is designed for the safe handling and disposal of RCA silicon wafer cleanup solutions. It is constructed of chemical and fire resistant white plastic with a 5.5 by 2.6 foot working surface. The hood features four temperature controlled cleanup baths, two cascade rinse tanks, a deionized-water sink and faucet, DI water and nitrogen spray guns, and three process timers.

SolventHood

General Solvent Hood

The General Solvent Hood is designed for the safe handling and disposal of organic solvents only. It is constructed of stainless steel with a 5 by 2.5 foot working surface. The hood features a temperature controlled hot plate, three solvent tanks, a solvent drain, a deionized-water sink and faucet, DI water and nitrogen spray guns, and two process timers.

SolventHood

Solvent Hood

The Solvent Hood is designed for the safe handling and disposal of organic solvents only. It is constructed of stainless steel with a 3 by 2.5 foot working surface. The hood features a temperature controlled hot plate, a deionized-water sink and faucet, a solvent tank, an ultrasonic tank, DI water and nitrogen spray guns, and two process timers.