General descriptions of the tool set is described below.
Characterization & Metrology
- DM05 Leica INM 200 Optical Microscope
- DM01 Leica INM 100 Optical Microscope
- Zeiss SIGMA 500 VP Scanning Electron Microscope
- Oxford Asylum Research Jupiter XR AFM
- Woollam Ellipsometer
- Jandel 4-Point Wafer Probe
- DP03 Alessi 4-Point Probe
- DS01 TOHO FLX2320 Thin Film Stress
- Veeco Dektak VIII Prolifometer
- DT05 Nanometrics Nanospec Film Thickness
- Rame-Hart Goniometer
Deposition
- TL01 Tystar LPCVD Furnaces
- PD01/PD02 Plasma-Therm 790 PECVD
- PD03 Plasma-Therm Vision 310 PECVD
- TC02 Ultratech/Cambridge NanoTech Savannah 100 Atomic Layer Deposition
- TD03 SCS Parylene Deposition
- TC03 Picosun R-200 Advanced Plasma ALD–COMING Fall 2022 for deposition of PEALD TiN and other pure metal films
Plasma Etch
- PE03 Plasma-Therm ICP-Metal Etcher
- PE04 Plasma-Therm Dielectric & DSE Etcher
- PE05 Plasma-Therm III-V Etcher
- Trion Sirius-T2 RIE Etcher
- March Asher PX250
Lithography
- Heidelberg DWL66 Laser Writer
- Photoresist provided by CRL
- Karl Suss MA6B #2 Contact Printer
- Karl Suss MA6B #1 Contact Printer
- Microlight 3D Smartprint UV Maskless Lithography System
- Ultratech Mask Cleaner
- CEE Spin Coater
- Headway Spinner
- CPK Chrome Etch & Base Develop
- CPK Solvent Develop
- TO03-TO07 Blue M Ovens
- Cole Parmer Ovens
- TO02 HMDS Oven
- TPS Digital Hot Plates
- Raith 150-TWO E-Beam
- Solvent Trash Can Exhaust
Thermal Processing
- JetFirst RTP
- TR02, TR03 MPTC600 RTP
- MiniBrute Furnaces
- Tystar Diffusion/Oxidation Furnaces
- TV01 Vacuum Oven
Thin Film Deposition
- ME02 Cryo e-gun Evaporator
- ME03 Temescal e-gun Evaporator
- ME01 CHA Mark 50 e-gun Evaporator
- MS02 Hummer VI Sputter (for SEM samples)
- MS03 AJA 1500 Sputter
- MS04 AJA Orion Sputter
- E-beam Evaporator System Overview